METHOD FOR FORMING METAL OXIDE FILM

PROBLEM TO BE SOLVED: To swiftly detect the abnormality of an electric circuit in the production of a metal oxide film by electrodeposition, and to prevent the reduction of yield. SOLUTION: In the film formation method where a d.c. source is connected to each of a plurality of metal electrodes arran...

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Main Authors YAMADA SATOSHI, IWATA MASUMITSU, NISHIMOTO TOMONORI, TOYAMA JO, KONDO TAKAHARU, HAYASHI SUSUMU, SONODA YUICHI, MIYAMOTO YUSUKE
Format Patent
LanguageEnglish
Published 22.06.2006
Subjects
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To swiftly detect the abnormality of an electric circuit in the production of a metal oxide film by electrodeposition, and to prevent the reduction of yield. SOLUTION: In the film formation method where a d.c. source is connected to each of a plurality of metal electrodes arranged in parallel, and a metal oxide film is electrodeposited on a beltlike electrically conductive counter substrate, the electric potential of each metal electrode to the electric potential of a correcting electrode located on the beltlike substrate is measured, further, in the case the difference in the electric potential between the adjoining metal electrodes exceeds a prescribed value, the electric circuit on the side whose electric potential is higher is shielded from the whole circuit. Alternatively, after the shielding, an electrode in a spare system is energized. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20040353859