ROTATION MEASURING APPARATUS AND FABRICATING METHOD
PROBLEM TO BE SOLVED: To provide a rotation measuring apparatus, achieving stability in manufacturing process, cost reduction, and refinement in structure, and to provide a fabrication method therefor. SOLUTION: The rotation measuring apparatus comprises a pair of vibrating sections on a substrate h...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
01.06.2006
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a rotation measuring apparatus, achieving stability in manufacturing process, cost reduction, and refinement in structure, and to provide a fabrication method therefor. SOLUTION: The rotation measuring apparatus comprises a pair of vibrating sections on a substrate having electrostatic vibrators, support bodies connected to the substrate, elastic bodies mutually connecting the support bodies and the electrostatic vibrators, and a pair of measurement electrodes placed on the substrate, mutually corresponding to the pair of vibrating sections. When vibration is generated by electrostatic force and rotation is generated due to the influence of the Coriolis force in the pair of vibrating sections, by making the pair of vibrating sections swing vertically to the substrate and the changing the amounts of the electrical capacities between the measuring electrodes and the vibrating sections, the amount of rotation is measured. The fabricating method of the rotation measuring apparatus can be completed, using one mask during the semiconductor manufacturing process, which prevents generation of influence on measurement results, together with the unsymmetrical structures, with errors generated among different masks during the manufacturing process. COPYRIGHT: (C)2006,JPO&NCIPI |
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Bibliography: | Application Number: JP20050327591 |