PALLET AND HOLDING METHOD

• Main Authors: HOTTA AKIHIRO, KISO TETSUTARO, SASAKI YOSHIMITSU, TANAKA TSUNEKI, MOGI KUNIO, SOSHI YOSHIICHI
• Format: Patent
• Language: English
• Published: 01.06.2006
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a workpiece pallet for precisely holding a workpiece. SOLUTION: The workpiece pallet 1 has a base member 10 and a mask member 30, which are placed so as to be parallel to each other and hold elements 2 for a piezoelectric actuator of workpieces in between themselves, and a spacer member 20 which is placed in between the base member 10 and the mask member 30, and determines a position of the workpieces with respect to the base member 10, wherein the base member 10 has a permanent magnet 11 arranged so as to protrude therefrom; the spacer member 20 is placed so as not to protrude farther than the workpiece in a direction toward the mask member 30 from the base member 10; and the mask member 30 is formed of a magnetic material, is placed at a position predetermined with respect to the spacer member 20, and contacts with the permanent magnet 11. COPYRIGHT: (C)2006,JPO&NCIPI