PHOSPHAZENE MIXTURE AND RESIN COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To prepare a phosphazene mixture containing neither halogen compound nor antimony compound, slight in burden on the environment, having high flame retardancy and causing no decline in the heat resistance of a resin when incorporated therein, and to obtain a resin composition co...

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Bibliographic Details
Main Authors NAKABASHI JUNICHI, MURAKAMI FUMIKI
Format Patent
LanguageEnglish
Published 11.05.2006
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
ADHESIVES
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC CHEMISTRY
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Summary:PROBLEM TO BE SOLVED: To prepare a phosphazene mixture containing neither halogen compound nor antimony compound, slight in burden on the environment, having high flame retardancy and causing no decline in the heat resistance of a resin when incorporated therein, and to obtain a resin composition containing the phosphazene mixture. SOLUTION: The phosphazene mixture consists of a hexa-2,6-xylenoxycyclic phosphazene(A) of formula(1) and a hexaphenoxycyclic phosphazene(B) of formula(2) in the weight ratio A/B of (1:99) to (99:1). COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20040304334