IMAGE EXPOSURE DEVICE AND METHOD

• Main Author: SUNAKAWA HIROSHI
• Format: Patent
• Language: English
• Published: 13.04.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; CORRECTION OF TYPOGRAPHICAL ERRORS; ELECTROGRAPHY; HOLOGRAPHY; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; LINING MACHINES; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTING; SELECTIVE PRINTING MECHANISMS; STAMPS; TRANSPORTING; TYPEWRITERS

PROBLEM TO BE SOLVED: To provide an image exposure device and method which can obtain printing plates superior in color reproduction, without uneven colors and can expose predetermined images, even by multiple or scanning exposures. SOLUTION: This image exposure device 10 has a two-dimensional spatial light modulator element to modulate the light beam for irradiating the original printing plate based on the image signals, an exposure means for making the illumination light irradiated in pulses to the two-dimensional spatial light modulating element for a time shorter than the exposure time, and a transfer means of relatively moving the exposure means and the original printing plate P in two dimensions. The two-dimensional spatial light modulating element modulates the illumination light from the illumination means, and modulators are arranged in m rows in a 1st direction and n columns in a 2nd direction in the direction orthogonal to the 1st direction to radiate the light beam to the original printing plate. This two-dimensional spatial light modulating element is preferably arranged, by inclining the 1st direction, at an angle θ(rad) expressed by 1/m to the scanning direction moving by the moving means. COPYRIGHT: (C)2006,JPO&NCIPI