PHOTOMASK, AND METHOD AND DEVICE FOR CLEANING THE SAME
PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask has a mask substrate where an electronic circuit pattern used to manufacture a semiconductor device is drawn, a lower frame bonded onto the mas...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
06.04.2006
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask has a mask substrate where an electronic circuit pattern used to manufacture a semiconductor device is drawn, a lower frame bonded onto the mask substrate to surround the electronic circuit pattern, an upper frame provided detachably to the lower frame, and a pellicle films fitted to the upper frame, the lower frame and upper frame having means of holding them in contact with each other with dynamic stress. COPYRIGHT: (C)2006,JPO&NCIPI |
---|---|
AbstractList | PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask has a mask substrate where an electronic circuit pattern used to manufacture a semiconductor device is drawn, a lower frame bonded onto the mask substrate to surround the electronic circuit pattern, an upper frame provided detachably to the lower frame, and a pellicle films fitted to the upper frame, the lower frame and upper frame having means of holding them in contact with each other with dynamic stress. COPYRIGHT: (C)2006,JPO&NCIPI |
Author | YAMAGUCHI ATSUMI |
Author_xml | – fullname: YAMAGUCHI ATSUMI |
BookMark | eNrjYmDJy89L5WQwC_DwD_H3dQz21lFw9HNR8HUN8fB3ATNdXMM8nV0V3PyDFJx9XB39PP3cFUI8XBWCHX1deRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGBmYGloZmZuaMxUYoAIZopgQ |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | JP2006091667A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_JP2006091667A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 11:51:34 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_JP2006091667A3 |
Notes | Application Number: JP20040279436 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060406&DB=EPODOC&CC=JP&NR=2006091667A |
ParticipantIDs | epo_espacenet_JP2006091667A |
PublicationCentury | 2000 |
PublicationDate | 20060406 |
PublicationDateYYYYMMDD | 2006-04-06 |
PublicationDate_xml | – month: 04 year: 2006 text: 20060406 day: 06 |
PublicationDecade | 2000 |
PublicationYear | 2006 |
RelatedCompanies | RENESAS TECHNOLOGY CORP |
RelatedCompanies_xml | – name: RENESAS TECHNOLOGY CORP |
Score | 2.6470938 |
Snippet | PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
Title | PHOTOMASK, AND METHOD AND DEVICE FOR CLEANING THE SAME |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060406&DB=EPODOC&locale=&CC=JP&NR=2006091667A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dS8Mw8Jjz802nok4liPTJ4jRZ1j4M6ZLMbtoPXJW9jTbtQIRuuIp_3zT7cE97CxdyXI5c7iN3F4BbnEpKleIx47INAKEWMWOa2ibBYzlOcVMtKuMdnk_dd9IfNocV-FrWwug-ob-6OaKSKKnkvdD39fQ_iMV1buXsPvlUoMlTN2pzY-UdqzNJDd5pizDgATMYa_dDw3-bzylTiLacLdgu7eiy0b746JRlKdN1ndI9hJ1QocuLI6hkeQ322fLrtRrseYsX7xrs6hRNOVPAhRjOjoGGbhAFnjN4uUOOz5EnIjfgesjFR48JpHw7xF6F4_f8ZxS5Ag0cT5zATVdEzDUVKaPVxkf9cI1sfArVfJJnZ4BI2hhbUtoyeYiJTGJL2pmtmP4osdXCuHUO9Q2ILjbO1uFgHmUgZoNeQrX4_smulN4tkmvNrz-g5ICZ |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dT8Iw8IL4gW-KGhU_GmP25CLa0m0PxIyuOD72EZmEN7J1IzEmg8iMf99SAXnirblLL9dLr9e73l0B7nEqKJWGR48XbQAINYke09TSCZ6ISYobctIi3uH51H0n3VFjVILPVS2M6hP6o5ojSo0SUt8LdV7P_oNYjsqtnD8mHxI0fWlHTUdbe8dyT1LNaTV5GDgB0xhrdkPNf_vDyasQNewd2DWkT6h8pWFrUZYy27Qp7SPYCyW5vDiGUpZXocJWX69V4cBbvnhXYV-laIq5BC7VcH4CNHSDKPDsQe8B2b6DPB65gaOGDh92GEfSt0Osz22_47-iyOVoYHv8FO7aPGKuLlkZrxc-7oYbbOMzKOfTPDsHRNL6xBTCEslTTEQSm8LKLCn0Z4FNA2PjAmpbCF1uxd5CxY28_rjf8Xs1OPyLOBC9Tq-gXHx9Z9fSBhfJjZLdL8kug4M |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=PHOTOMASK%2C+AND+METHOD+AND+DEVICE+FOR+CLEANING+THE+SAME&rft.inventor=YAMAGUCHI+ATSUMI&rft.date=2006-04-06&rft.externalDBID=A&rft.externalDocID=JP2006091667A |