PHOTOMASK, AND METHOD AND DEVICE FOR CLEANING THE SAME

PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask has a mask substrate where an electronic circuit pattern used to manufacture a semiconductor device is drawn, a lower frame bonded onto the mas...

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Bibliographic Details
Main Author YAMAGUCHI ATSUMI
Format Patent
LanguageEnglish
Published 06.04.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a photomask configured to attach and detach two half pellicle frames without using a magnetic body. SOLUTION: The photomask has a mask substrate where an electronic circuit pattern used to manufacture a semiconductor device is drawn, a lower frame bonded onto the mask substrate to surround the electronic circuit pattern, an upper frame provided detachably to the lower frame, and a pellicle films fitted to the upper frame, the lower frame and upper frame having means of holding them in contact with each other with dynamic stress. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20040279436