LITHOGRAPHY INSTRUMENT AND METHOD OF CALIBRATING THE SAME

PROBLEM TO BE SOLVED: To provide a lithography instrument including a substrate table and a movement control system for controlling the movement of the substrate table. SOLUTION: The movement control system includes three positional detectors P1 to P5 which are established to detect the position of...

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Bibliographic Details
Main Authors LOOPSTRA ERIK ROELOF, LEVASIER LEON M, OESTERHOLT RENE
Format Patent
LanguageEnglish
Published 23.02.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a lithography instrument including a substrate table and a movement control system for controlling the movement of the substrate table. SOLUTION: The movement control system includes three positional detectors P1 to P5 which are established to detect the position of a substrate table WT. To measure the position and the orientation of the substrate table WT, the three position detectors P1 to P5 have optical encoders of one-dimensional or multi-dimensional types. The optical encoders are disposed such that they provide at least six position values in total so that at least one position value is provided for each of three dimensions. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20050215936