PHOTOPOLYMERIZABLE COMPOSITION AND COLOR FILTER OBTAINED BY USING THE SAME

PROBLEM TO BE SOLVED: To provide a resist material for forming a pattern having a thin film and high light shielding property by a photolithography method, and having sufficient sensitivity and resolution; to highly accurately manufacture a resin BM of a color filter at a low cost; to ensure excelle...

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Bibliographic Details
Main Author TSUJI SHIGEO
Format Patent
LanguageEnglish
Published 23.02.2006
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Summary:PROBLEM TO BE SOLVED: To provide a resist material for forming a pattern having a thin film and high light shielding property by a photolithography method, and having sufficient sensitivity and resolution; to highly accurately manufacture a resin BM of a color filter at a low cost; to ensure excellent display ability such as contrast for a liquid crystal display using a color filter thus manufactured: and to achieve high image quality and no pollution by such a color filter by making a BM into resin. SOLUTION: The photopolymerizable composition contains (a) a black color material, (b) an organic binder, (c) a photopolymerization initiator and (e) a polymer dispersant having a basic functional group, wherein the organic binder (b) is an epoxyacrylate resin having a carboxyl group and the photopolymerization initiator (c) is an oxime ester compound shown by formula (6). The photopolymerizable composition realizes formation of a resin black matrix (BM) of high quality at a low cost because the photopolymerizable composition has excellent sensitivity and resolution although it has high light shielding property in a thin film state. A color filter obtained by using the resin BM enables the display quality of a liquid crystal element to be improved because the color filter has excellent accuracy, flatness and durability. The risk for a human body is decreased and the environmental safeness is increased because no harmful substance is included in the manufacturing process and in the color filter itself. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20050236675