PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS, AND METHOD FOR CLEANING SQUEEZING MEANS

• Main Authors: NOMURA YOSHIKI, HAYASHI KEIICHI, MARUHASHI ATSUSHI
• Format: Patent
• Language: English
• Published: 09.02.2006
• Subjects: ACCESSORIES THEREFOR; APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; PHOTOGRAPHY; PHYSICS

PROBLEM TO BE SOLVED: To provide a method for cleaning a squeezing means by which a squeezing means with dirt adhered can be cleaned by spraying a cleaning liquid at efficient timing, and to provide a photosensitive material processing apparatus which performs the method. SOLUTION: The system waits until a recording sheet S passes in a step S10. After the recording sheet S passed, the system determines whether a cleaning flag is ON or not, that is, the interval of recording sheets S is equal to or longer than a specified time interval T or not in a step S12. When the cleaning flag is ON, the system determines whether a sheet number flag is ON or not in a step S14. If the flag is ON, instruction of cleaning is outputted to a pump P in a step S16, and thereby, the pump P is operated to spray cleaning water through each spraying port during a specified spraying period TF. COPYRIGHT: (C)2006,JPO&NCIPI