PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS, AND METHOD FOR CLEANING SQUEEZING MEANS

PROBLEM TO BE SOLVED: To provide a method for cleaning a squeezing means by which a squeezing means with dirt adhered can be cleaned by spraying a cleaning liquid at efficient timing, and to provide a photosensitive material processing apparatus which performs the method. SOLUTION: The system waits...

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Bibliographic Details
Main Authors NOMURA YOSHIKI, HAYASHI KEIICHI, MARUHASHI ATSUSHI
Format Patent
LanguageEnglish
Published 09.02.2006
Subjects
ACCESSORIES THEREFOR
APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide a method for cleaning a squeezing means by which a squeezing means with dirt adhered can be cleaned by spraying a cleaning liquid at efficient timing, and to provide a photosensitive material processing apparatus which performs the method. SOLUTION: The system waits until a recording sheet S passes in a step S10. After the recording sheet S passed, the system determines whether a cleaning flag is ON or not, that is, the interval of recording sheets S is equal to or longer than a specified time interval T or not in a step S12. When the cleaning flag is ON, the system determines whether a sheet number flag is ON or not in a step S14. If the flag is ON, instruction of cleaning is outputted to a pump P in a step S16, and thereby, the pump P is operated to spray cleaning water through each spraying port during a specified spraying period TF. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20040220311