RADIATION SENSITIVE COMPOSITION FOR FORMING COLORED LAYER AND COLOR FILTER

• Main Authors: KOYAMA TAKAYOSHI, KAMII HIDEYUKI, IIJIMA TAKAHIRO, NAGATSUKA TOMIO
• Format: Patent
• Language: English
• Published: 12.01.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for forming a colored layer having excellent developability, free of remaining of undissolved matter and scumming on a pattern edge in development, and also free of chipping and undercut of a pattern edge and peeling of the pattern itself even under low exposure energy. SOLUTION: The radiation sensitive composition for forming a colored layer contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a photoradical generator containing a compound represented by formula (1) and/or a compound represented by formula (2) as an essential component, and (E) a polyfunctional mercaptan compound. In the formulae, each R1denotes a (substituted) alkyl group or a (substituted) phenyl group; each R2denotes H, a (substituted) alkyl group or a (substituted) phenyl group; R3denotes H or a (substituted) alkyl group; and each R4, each R5and each R6each denotes H or a (substituted) alkyl group. COPYRIGHT: (C)2006,JPO&NCIPI