WASHING DRYING METHOD AND WASHING DRYING DEVICE

• Main Author: YANO YOSHINOBU
• Format: Patent
• Language: English
• Published: 05.01.2006
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DRYING; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; SEMICONDUCTOR DEVICES; WEAPONS

PROBLEM TO BE SOLVED: To provide a washing drying method where, even in the case of a work with a complicated structure, it can be uniformly and efficiently subjected to washing and drying treatment as the formation of an oxide film is prevented, and to provide a device therefor. SOLUTION: A work subjected to cutting or polishing is washed with an organic solvent. Thereafter, an oxygen-containing air flow is fed into a passage 2 by a blower 1 and ozone is generated by an ozone generating unit 4, and the ozone is converted into excited oxygen atoms (excited singlet oxygen atoms) by an exciting unit 5. The air flow enough in the excited oxygen atoms is fed to a washing drying chamber 6, and the work 8 in the washing drying chamber is treated. Organic matter stuck to the work 8 is oxidized and decomposed by the excited oxygen atoms, and the work is washed and dried. At the time when the work is fed to surface treatment such as vapor deposition, high adhesion can be obtained. COPYRIGHT: (C)2006,JPO&NCIPI