POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN AND ELECTRONIC COMPONENT USING SAME

• Main Authors: ANDO SHINJI, UEDA MITSURU, MINEGISHI TOMONORI, TOYOKAWA IKUHIRO, IWASHITA KENICHI
• Format: Patent
• Language: English
• Published: 17.11.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition developable with an alkali and having excellent transmittance for rays in the i-line region from a mercury lamp, preferable sensitivity, excellent developing property and preferable resolution. SOLUTION: The positive photos...