GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, METHOD FOR PRODUCING GLASS SUBSTRATE FOR MASK BLANK, AND POLISHING DEVICE

• Main Authors: TOCHIHARA YASUTAKA, KOIKE KESAHIRO
• Format: Patent
• Language: English
• Published: 10.11.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GLASS; GRINDING; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHING; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a mask blank suitable for manufacturing a semiconductor device using short-wavelength light and/or a glass substrate for the mask blank. SOLUTION: The glass substrate 10 has opposite principal surfaces 2 and end faces 1 adjacent to the outer edges of the opposite principal surfaces 2, and when the glass substrate 10 is flatwise viewed, it has end face parts 1f of a curved surface shape adjacent to near the corner parts 10a of the substrate, wherein the end face parts 1f of the curved surface shape are provided with a mirror finished surface having an arithmetic average surface roughness Ra of ≤0.5 nm. COPYRIGHT: (C)2006,JPO&NCIPI