POLYMER

• Main Authors: UEDA TERUSHI, MOMOSE AKIRA, OTAKE ATSUSHI, FUJIWARA TADAYUKI
• Format: Patent
• Language: English
• Published: 22.09.2005
• Edition: 7
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide a polymer excellent in solubility in solvents and heat resistance and a composition thereof, to provide a fine pattern-manufacturing method using the polymer, and to provide a polymer useful, in the manufacture of a semiconductor resist pattern, for adjusting adhesion properties between an antireflection film applied on a substrate and the resist, and a coating material for the antireflection film. SOLUTION: The polymer contains a constituting unit represented by formula (1) (wherein R1is a hydrogen atom or a methyl group) and at least one constituting unit selected from the group consisting of a constituting unit represented by formula (2-1) (wherein R21is a hydrogen atom or a methyl group) and a constituting unit represented by formula (2-2) (wherein R22is a hydrogen atom or a methyl group). COPYRIGHT: (C)2005,JPO&NCIPI