PHOTORESIST COMPOSITION CONTAINING Si-COMPONENT

PROBLEM TO BE SOLVED: To provide a photoresist composition exhibiting high storage stability. SOLUTION: The photoresist composition contains (i) a photoactive component, (ii) a component containing one or more Si components, and (iii) a component containing one or more sulfonic acid moieties, and co...

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Bibliographic Details
Main Authors YASUHIRO SUZUKI, ABLAZA SHERI L, JAMES F CAMERON
Format Patent
LanguageEnglish
Published 18.08.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a photoresist composition exhibiting high storage stability. SOLUTION: The photoresist composition contains (i) a photoactive component, (ii) a component containing one or more Si components, and (iii) a component containing one or more sulfonic acid moieties, and contains a non-hydroxyl solvent such as propylene glycol methyl ether acetate as a main or total solvent. COPYRIGHT: (C)2005,JPO&NCIPI
Bibliography:Application Number: JP20040380229