METHOD AND APPARATUS FOR FORMING COATING FILM

• Main Authors: SAITO KIMIHIDE, MIZUNO GOSHI
• Format: Patent
• Language: English
• Published: 11.08.2005
• Edition: 7
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a coating film forming method and coating film forming apparatus in which a coating liquid is applied to the surface of a substrate, an air current flowing from the center to the outside is then formed along with the surface, and an intra-surface uniform coating film can be formed on the surface of the substrate, by controlling the flow of the coating liquid on the substrate when forming the film by drying the coating liquid under pressure reduction. SOLUTION: A liquid film is formed by supplying a coating liquid over the surface of a substrate so as to form a non-coated area all over the circumference at the edge of the substrate in the state of horizontally holding the substrate, the substrate is then carried into a treatment container, and pressure in the treatment container is reduced while confronting a rectifier plate to the surface of the substrate near the substrate, thereby forming an air current flowing from the center to the outside along with the surface of the substrate, and drying the liquid film. COPYRIGHT: (C)2005,JPO&NCIPI