PROCESS FOR REFINING CRUDE RESIN FOR RESIST

• Main Authors: ATSUJI KOTA, IWAI TAKESHI, MUROI MASAAKI, TOMITA HIROAKI, MIYAIRI YOSHIKAZU, HANEDA HIDEO
• Format: Patent
• Language: English
• Published: 14.07.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; CRACKING HYDROCARBON OILS; ELECTROGRAPHY; FUELS; HOLOGRAPHY; LUBRICANTS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; MINERAL WAXES; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PEAT; PETROLEUM, GAS OR COKE INDUSTRIES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVEHYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, ORGASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; TECHNICAL GASES CONTAINING CARBON MONOXIDE; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a process for refining a crude resin for a resist capable of effectively removing by-products such as polymers and oligomers contained within the crude resin, a resist resin obtained by the refining process, a process for producing a photoresist composition using the resist resin, and a photoresist composition using the resist resin. SOLUTION: In the process for refining the crude resin of a resist resin (A) used in a photoresist composition containing at least the resist resin (A) and an acid generator (B) dissolved in an organic solvent (C1), if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution comprising the crude resin of the component (A) dissolved in an organic solvent (C2) is labeled Y, (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered. The resist resin is obtained by the refining process. The photoresist composition uses the resist resin and the process for producing the photoresist composition is also provided. COPYRIGHT: (C)2005,JPO&NCIPI