METHOD OF FORMING METAL PATTERN WITH LOW RESISTANCE

• Main Authors: SONG KI-YONG, TAMARA BIKU, T V GAEVSKAYA, V G SOKOLOV, G A BRANITSKIJ, NO CHANG-HO, KIM JIN YOUNG
• Format: Patent
• Language: English
• Published: 07.07.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To provide a method of forming metal patterns which is capable of forming a single or multi layers quickly and effectively by simple manufacture processes without the necessity of such additional processes as a process for forming a metal thin film requiring high vacuum and high temperature conditions or an exposure process for forming a fine pattern and a subsequent etching process, and also to provide a flat type display device manufactured by the same. SOLUTION: A method of forming a metal pattern, comprising the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film; (ii) coating a water-soluble polymer compound on the photocatalyst film to form a water-soluble polymer layer; (iii) selectively exposing the photocatalytic film and the water-soluble polymer layer to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern of the nucleus for crystal growth to grow metal crystals thereon, thereby forming a metal pattern. COPYRIGHT: (C)2005,JPO&NCIPI