DUST-FREE AND PORE-FREE, HIGH PURITY POLYCRYSTALLINE GRANULATED SILICON, ITS PRODUCTION PROCESS AND ITS USE

PROBLEM TO BE SOLVED: To provide a polycrystalline granulated silicon which does not have the drawbacks of the known granulated polysilicon. SOLUTION: The polycrystalline granulated silicon is made of particles which have a density of greater than 99.9% of the theoretical solid density and therefore...

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Bibliographic Details
Main Authors WEIDHAUS DIETER, SCHREIEDER FRANZ, CROESSMANN IVO
Format Patent
LanguageEnglish
Published 07.07.2005
Edition7
Subjects
CHEMISTRY
COMPOUNDS THEREOF
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Summary:PROBLEM TO BE SOLVED: To provide a polycrystalline granulated silicon which does not have the drawbacks of the known granulated polysilicon. SOLUTION: The polycrystalline granulated silicon is made of particles which have a density of greater than 99.9% of the theoretical solid density and therefore have a pore content of less than 0.1% and have a surface roughness Raof less than 150 nm. COPYRIGHT: (C)2005,JPO&NCIPI
Bibliography:Application Number: JP20040364959