PLASMA ETCHING APPARATUS
PROBLEM TO BE SOLVED: To provide a plasma etching apparatus having a chamber into which gas flows uniformly. SOLUTION: The plasma etching apparatus has the chamber 10, which is equipped with an upper plasma electrode 32 in its upper portion and a lower plasma electrode 31 in its lower portion, respe...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
31.03.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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