EXTREME ULTRAVIOLET RAY OPTICAL SYSTEM AND EXPOSURE DEVICE

PROBLEM TO BE SOLVED: To provide an extreme ultraviolet ray optical system capable of improving image formation performance by reducing the adverse effects of stray light, and an exposure device provided with such optical system. SOLUTION: The projection optical system of an exposure device is provi...

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Bibliographic Details
Main Author OSHINO TETSUYA
Format Patent
LanguageEnglish
Published 31.03.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an extreme ultraviolet ray optical system capable of improving image formation performance by reducing the adverse effects of stray light, and an exposure device provided with such optical system. SOLUTION: The projection optical system of an exposure device is provided with a total of six mirrors (multilayer mirrors) M1 to M6. Each of the mirrors M1 to M6 is held by a holding mechanism, respectively, and can be finely positioned by a position adjusting mechanism. In this optical system, a total of six stray light stops 41 to 46 are arranged. Each of the stray light stops 41 to 46 is for preventing the stray light from an EUV luminous flux E from reaching a wafer W located at the downstream of the optical system. According to this exposure device, stray light can be intercepted by the stray light stops 41 to 46. Thus, the adverse effects of the stray light to exposure are reduced, and the contrast of an exposure pattern can be improved. COPYRIGHT: (C)2005,JPO&NCIPI
Bibliography:Application Number: JP20030319560