POLYMER FOR RESIST, RESIST MATERIAL AND PATTERN-FORMING METHOD

• Main Authors: WATANABE TAKESHI, TSUCHIYA JUNJI, FUNATSU AKIYUKI, HASEGAWA KOJI, NISHI TSUNEHIRO
• Format: Patent
• Language: English
• Published: 03.03.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a resist material which is prepared by using a polymer and is sensitive to high energy rays, excellent in resolution and a size difference between a dense pattern and a sparse pattern and therefore useful for microfabrication for manufacturing a VLSI by electron beams or far ultraviolet rays. SOLUTION: The resin whose dissolution rate in an alkali developer is increased by the action of an acid comprises a polymer containing at least one of each of recurring units represented by general formulae (1)-(4). In general formulae (1)-(4), R1, R2, R3and R6are each independently a hydrogen atom or a methyl group; R4and R5are each independently a hydrogen atom or a hydroxy group; X is a tertiary exo-alkyl group bearing a bicyclo[2.2.1]heptane skeleton represented by either one of general formulae (X-1) to (X-4); and Y is a tertiary alkyl group bearing an adamantane skeleton. In general formulae (X-1) to (X-4), R7is a 1-10C straight chain, branched or cyclic alkyl group; and the dashed line means a bonding position and a bonding direction. COPYRIGHT: (C)2005,JPO&NCIPI