METHOD OF FORMING AND APPARATUS OF COATING FILM

• Main Authors: KASHIWAGI TOSHIO, SUZUKI TAKAYUKI, MIZUTANI MASAYA, KOBAYASHI HIDEO, OZAWA NAOTO, TERADA HIDEKI
• Format: Patent
• Language: English
• Published: 17.02.2005
• Edition: 7
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To form a film uniform in thickness over the whole surface of a substrate. SOLUTION: Radiation of light by a plasma light emission or through a liquid crystal panel is successively moved from the central side toward the outer peripheral side in a process of expanding a liquid material supplied to the central side of a substrate in the annular state or dropwise in the center by rotation, while expanding the liquid material, or at the time of interruption while repeating alternately expansion and interruption of expansion, the thickness of the liquid material is confirmed from the central side successively by irradiation of the above light. Thus, the method for preparing a resin film and the device are constituted. COPYRIGHT: (C)2005,JPO&NCIPI