TRANSPARENT BASE SUBSTRATE WITH TRANSPARENT CONDUCTIVE FILM, ITS MANUFACTURING METHOD, PHOTOELECTRIC CONVERSION DEVICE AND SUBSTRATE THEREFOR

PROBLEM TO BE SOLVED: To provide a transparent base substrate with a transparent conductive film which has reduced light absorbing property (high light transmitting property) over a light wavelength range from visible light to near-infrared light, appropriate irregularities on a surface where a phot...

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Bibliographic Details
Main Authors FUJISAWA AKIRA, ARAI DAISUKE, SETO YASUNARI
Format Patent
LanguageEnglish
Published 24.12.2004
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide a transparent base substrate with a transparent conductive film which has reduced light absorbing property (high light transmitting property) over a light wavelength range from visible light to near-infrared light, appropriate irregularities on a surface where a photoelectric conversion layer is formed, and a high conductivity; and to provide its manufacturing method. SOLUTION: The transparent base substrate with the transparent conductive film has a low light absorbing property over the light wavelength range from 800 to 1,100 nm, and appropriate irregularities on the surface, and is low in electric resistivity. The transparent base substrate with the transparent conductive film is produced by controlling a film forming velocity for the transparent conductive film from 3,000 to 7,000 nm/min under a deposition temperature 600°C or more and less than 640°C, or from 3,000 to 8,000 nm/min under a deposition temperature 640°C or more. COPYRIGHT: (C)2005,JPO&NCIPI
Bibliography:Application Number: JP20030157373