POROUS POLYBENZAZOLE-BASED FILM AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a porous polybenzazole-based film useful as a member of a cell and the like which simultaneously exhibits excellent heat resistance, mechanical strengths, resistance to interlayer separation and impregnatability with a functional agent, and its manufacturing method....

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Bibliographic Details
Main Authors KAWAHARA KEIZO, OKAMOTO KAZUTAKE, KOBAYASHI HISATO
Format Patent
LanguageEnglish
Published 11.11.2004
Edition7
Subjects
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOSITIONS BASED THEREON
ELECTRICITY
GENERAL PROCESSES OF COMPOUNDING
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a porous polybenzazole-based film useful as a member of a cell and the like which simultaneously exhibits excellent heat resistance, mechanical strengths, resistance to interlayer separation and impregnatability with a functional agent, and its manufacturing method. SOLUTION: The porous polybenzazole-based film has a porosity of 90-98 vol%. Preferably, the porous polybenzazole-based film has at least 3 pores having a maximum diameter of at least 0.5 μm per 10 μm2on the surface thereof. The manufacturing method comprises forming a polymer solution comprised of an optically isotropic polybenzazole polymer sandwiched between at least two porous supports into a thin film via a roll, a slit or a press, introducing the thin film into a coagulation bath, and peeling the supports in the coagulation bath thereby coagulating the polymer solution to form the film. COPYRIGHT: (C)2005,JPO&NCIPI
Bibliography:Application Number: JP20030112755