POLYMER AND PHOTORESIST COMPRISING SAME

• Main Authors: ZHANG TAO, LEE JAI HYOUNG, ZAMPINI ANTHONY
• Format: Patent
• Language: English
• Published: 21.10.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; AUXILIARY PROCESSES IN PHOTOGRAPHY; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a resin composition for use in a resist to form an image with high resolution in a short wavelength region such as that less than sub-300 nm and that less than sub-200 nm. SOLUTION: The invention presents a new polymer containing a non-carbon tetravalent chemical species (Si, Ti, Ge, Zr and Sn), and a photoimageable composition containing the above polymer. A preferred polymer is organic, and for example, one or more repeat units comprise carbon atoms. The polymer contains repeat units of SiO2or TiO2. The photoimageable composition comprises the above polymer and a photoactive component. COPYRIGHT: (C)2005,JPO&NCIPI