PURIFICATION METHOD FOR CRUDE RESIN TO BE USED AS ELECTRONIC MATERIAL

• Main Authors: ATSUJI KOTA, IWAI TAKESHI, HAYASHI RYOTARO, MUROI MASAAKI, SHIOTANI KAZUYUKI, TAKESHITA MASARU, TOMITA HIROAKI, HANEDA HIDEO
• Format: Patent
• Language: English
• Published: 09.09.2004
• Edition: 7
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DETERGENTS; ELECTROGRAPHY; ESSENTIAL OILS; FATTY ACIDS THEREFROM; GENERAL PROCESSES OF COMPOUNDING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PERFUMES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRODUCING (PRESSING, EXTRACTION), REFINING AND PRESERVINGFATS, FATTY SUBSTANCES (e.g. LANOLIN), FATTY OILS AND WAXES,INCLUDING EXTRACTION FROM WASTE MATERIALS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

PROBLEM TO BE SOLVED: To provide a purification method for crude resin to be used as an electronic material by effectively removing by-products, for example, oligomer included in the crude resin for electronic material and to provide a method for producing a chemical amplification type photoresist composition by using the oligomer-free electronic resin. SOLUTION: (a1) The crude resin for an electronic material bearing the construction units derived from a (meth)acrylic acid ester having a hydrophilic site is washed with a mixture of (b1) an organic solvent which dissolves the crude resin and is immmiscible with water to separate into two layers and (b2) water. COPYRIGHT: (C)2004,JPO&NCIPI