EXPOSURE SYSTEM
PROBLEM TO BE SOLVED: To enable an exposure unit and a treatment unit to be positioned easily without increasing their sizes and costs while keeping static stability. SOLUTION: This exposure system includes the exposure unit EU which exposes a pattern formed in a mask to a substrate; the treatment u...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
19.08.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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