EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To enable an exposure unit and a treatment unit to be positioned easily without increasing their sizes and costs while keeping static stability. SOLUTION: This exposure system includes the exposure unit EU which exposes a pattern formed in a mask to a substrate; the treatment u...

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Bibliographic Details
Main Authors ARAKI YASUO, SAKAMOTO HIDEAKI
Format Patent
LanguageEnglish
Published 19.08.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To enable an exposure unit and a treatment unit to be positioned easily without increasing their sizes and costs while keeping static stability. SOLUTION: This exposure system includes the exposure unit EU which exposes a pattern formed in a mask to a substrate; the treatment unit IU which is arranged away from the exposure unit EU in a first direction; and also a connector 63 which keeps under restraint the exposure unit EU and the treatment unit IU at least in the first direction, and connects these units with degree of freedom at least in one direction different from the first direction. COPYRIGHT: (C)2004,JPO&NCIPI
Bibliography:Application Number: JP20030022494