PLASMA PROCESSING SYSTEM

• Main Author: SHINOHARA HISAKUNI
• Format: Patent
• Language: English
• Published: 19.08.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR RELEVANT APPARATUS; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a plasma processing system capable of processing the surface of a sample uniformly. SOLUTION: The plasma processing system comprises a microwave generator 1, a first dielectric 15 connected with the microwave generator 1 and having a rectangular cross-section along the processing surface of the sample 12 where two opposite sides are parallel and making the field strength distribution of the microwave generated by the microwave generator 1 substantially uniform along the processing surface of the sample 12, and a means for processing the sample 12 using plasma generated in a reactor 4 by the microwave wherein the interval Ld1of two opposite sides of the first dielectric 15 substantially satisfies following expression (1) Ld1=nd1(λ1/2), where λ1is the wavelength of a microwave in the first dielectric and nd1is an integer of 1 or above. COPYRIGHT: (C)2004,JPO&NCIPI