ORGANIC ACID SALT DERIVATIVE OF PYRAZOLO[3,2-c]-1,2,4-TRIAZOLE COMPOUND

PROBLEM TO BE SOLVED: To obtain a pyrazolo[3,2-c]-1,2,4-triazole compound which is highly safe in a material, has reduced restriction of facilities in production, simple aftertreatment and isolation after reaction completion and excellent production suitability. SOLUTION: The organic acid salt deriv...

Full description

Saved in:
Bibliographic Details
Main Authors USU TATSUYA, MORI HIDETO
Format Patent
LanguageEnglish
Published 29.07.2004
Edition7
Subjects
AUXILIARY PROCESSES IN PHOTOGRAPHY
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
METALLURGY
ORGANIC CHEMISTRY
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To obtain a pyrazolo[3,2-c]-1,2,4-triazole compound which is highly safe in a material, has reduced restriction of facilities in production, simple aftertreatment and isolation after reaction completion and excellent production suitability. SOLUTION: The organic acid salt derivative of a pyrazolo[3,2-c]-1,2,4-triazole compound is represented by general formula (1) (R1is a 1-6C nonsubstituted alkyl group; R2-R7are each independently a hydrogen atom or a 1-3C nonsubstituted alkyl group; X1is a nonmetallic atomic group necessary for forming a 5-membered or 6-membered ring nitrogen-containing heterocycle; s and t are each independently 0 or 1 with the proviso that when s is 1 and t is 0, R2-R5are not methyl groups at the same time and when s is 1 and t is 0, R2and R3are not methyl groups and R4and R5are not hydrogen atoms at the same time; HX is an organic acid comprising X as an conjugate base). COPYRIGHT: (C)2004,JPO&NCIPI
Bibliography:Application Number: JP20020380433