CHARGE ELIMINATING METHOD OF ELECTROSTATIC CHUCK, AND ELECTROSTATIC CHUCK

PROBLEM TO BE SOLVED: To simply eliminate residual charges on a surface of an electrostatic chuck in a short time without being accompanied by heating. SOLUTION: In the charge eliminating method of an electrostatic chuck, after a wafer fixed on the electrostatic chuck is removed, a surface of the el...

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Bibliographic Details
Main Authors TSURUTA HIDEYOSHI, TORIGOE TAKESHI
Format Patent
LanguageEnglish
Published 17.06.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To simply eliminate residual charges on a surface of an electrostatic chuck in a short time without being accompanied by heating. SOLUTION: In the charge eliminating method of an electrostatic chuck, after a wafer fixed on the electrostatic chuck is removed, a surface of the electrostatic chuck is irradiated with ultraviolet ray whose main luminescence wavelength is in 150-450 nm wavelength region, and residual potential of the surface of the electrostatic chuck is eliminated. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020338446