METHOD FOR MANUFACTURING DIFFRACTION OPTICAL ELEMENT, DIFFRACTION OPTICAL ELEMENT, OPTICAL SYSTEM, AND OPTICAL PICKUP DEVICE

• Main Authors: SUZUKI TOMOYUKI, ITO ARIMICHI
• Format: Patent
• Language: English
• Published: 20.05.2004
• Edition: 7
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PROBLEM TO BE SOLVED: To provide a method for manufacturing a diffraction optical element for simultaneously and integrally forming a 1st and a 2nd optical elements disposed on both sides of a resin layer and for efficiently producing in large quantities, and to provide a diffraction optical element, an optical system using the diffraction optical element, and an optical picup device. SOLUTION: The 1st optical element is a diffraction grating, and a 2nd optical element is fine unevenness, on which protrusions which have heights at least ≥25% of a long wavelength in a wavelength range in which reflections are desired to be prevented and exhibits antireflection performance by bringing changes of refractive indexes of the fine unevenness and the air layer into a pseudo continuation are arranged in an interval shorter than a short wavelength in the wavelength range in which the reflections are desired to be prevented. The 1st and the 2nd optical elements are simultaneously formed on the both sides of the resin layer. COPYRIGHT: (C)2004,JPO