DESIGN OF LITHOGRAPHY MASK AND SYNTHESIS OF VARIOUS PROBE ON SUBSTRATE

PROBLEM TO BE SOLVED: To provide a computer system for forming a mask, more precisely, provide a system for forming a probe on a substrate by generating the mask and using the same, and a method therefor. SOLUTION: The system and the method for synthesizing the probe on the substrate are provided. A...

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Bibliographic Details
Main Authors HUBBELL EARL A, STRYER LUBERT, MITTMAN MICHAEL P
Format Patent
LanguageEnglish
Published 20.05.2004
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide a computer system for forming a mask, more precisely, provide a system for forming a probe on a substrate by generating the mask and using the same, and a method therefor. SOLUTION: The system and the method for synthesizing the probe on the substrate are provided. A monomer is uniformly added to a predetermined spot of the substrate by using one or more shift reticles. The shift reticles are shifted to the substrate between stages of adding the monomer. Further, characteristics of a predetermined probe can be specified in synthesizing the probe. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20030333828