METHOD FOR NANOPATTERNING USING ORGANIC UNIMOLECULAR FILM AS RESIST

PROBLEM TO BE SOLVED: To provide a nanopatterning method in which fine patterning in tens of nanometer can easily be realized with high resolution. SOLUTION: This method includes (a) a unimolecular film forming process of forming an organic unimolecular film on the surface of a patterned layer, (b)...

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Bibliographic Details
Main Authors NIWA DAISUKE, AISAKA TETSUYA
Format Patent
LanguageEnglish
Published 15.04.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a nanopatterning method in which fine patterning in tens of nanometer can easily be realized with high resolution. SOLUTION: This method includes (a) a unimolecular film forming process of forming an organic unimolecular film on the surface of a patterned layer, (b) a patterning method of removing a portion of the organic unimolecular film 3 by electron-beam lithography according to a specified pattern of a nanoscale, and (c) an etching process of removing the patterned layer 2 exposed at a removal part of the organic unimolecular film 3. The organic unimolecular film can easily be formed by using a self-organizing process of organic unimolecules. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020278205