METHOD FOR CLEANING PLASMA PROCESSOR
PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma processor for easily removing a reactant in a reaction chamber, after a plasma etching processing. SOLUTION: The method is composed of a first process for plasma-etching a member to be etched 17, which is arranged in the reaction chamber...
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Format | Patent |
Language | English |
Published |
08.04.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma processor for easily removing a reactant in a reaction chamber, after a plasma etching processing. SOLUTION: The method is composed of a first process for plasma-etching a member to be etched 17, which is arranged in the reaction chamber 11, by using SiCl4or BCl3and a second process for introducing a plasma of gas, comprising oxygen into the reaction chamber 11, after the first process. COPYRIGHT: (C)2004,JPO |
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AbstractList | PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma processor for easily removing a reactant in a reaction chamber, after a plasma etching processing. SOLUTION: The method is composed of a first process for plasma-etching a member to be etched 17, which is arranged in the reaction chamber 11, by using SiCl4or BCl3and a second process for introducing a plasma of gas, comprising oxygen into the reaction chamber 11, after the first process. COPYRIGHT: (C)2004,JPO |
Author | KUZUHARA TORU |
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Snippet | PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma processor for easily removing a reactant in a reaction chamber, after a plasma etching... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | METHOD FOR CLEANING PLASMA PROCESSOR |
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