SUBSTRATE INSPECTION UNIT AND SUBSTRATE CLEANING EQUIPMENT USING IT

PROBLEM TO BE SOLVED: To provide a substrate inspection unit which can detect the state of the bottom of a treatment container in which wafers are contained for reducing the break rate of substrates and substrate cleaning equipment which enhances the yield in the cleaning process by using the unit....

Full description

Saved in:
Bibliographic Details
Main Authors CHOI KI-RYONG, JUNG EUN-SAM, LIM MOON-TAEK
Format Patent
LanguageEnglish
Published 25.03.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PERFORMING OPERATIONS
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TESTING
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To provide a substrate inspection unit which can detect the state of the bottom of a treatment container in which wafers are contained for reducing the break rate of substrates and substrate cleaning equipment which enhances the yield in the cleaning process by using the unit. SOLUTION: This substrate inspection unit is equipped with the treatment container 10 which forms a predetermined treatment space, a substrate guide 21 which is installed on the bottom of the treatment container 10 to support substrates W so that they are perpendicular to the bottom, first sensors 30 which are installed on both sides of the treatment container 10 and detects substrates W that are supported by the substrate guide 21 so that they are perpendicular to the bottom, and second sensors 50 which are installed on a lower portion and a side of the treatment container 10 and detects any substrates lying on the bottom of the treatment container 10 and any foreign substances. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20030309748