SEMICONDUCTOR MEMORY DEVICE AND ITS MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor memory device in which a high quality multilayer insulating film such as an ON film or an ONO film is formed at low temperatures, and to provide its manufacturing method. SOLUTION: After forming a lower silicon oxide film 102 on a sili...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
25.03.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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