SURFACE IRREGULARITIES FORMING METHOD, OPTICAL FILM AND DIFFUSING REFLECTOR OBTAINED THEREBY, AND MANUFACTURE METHOD FOR DIFFUSING REFLECTOR

PROBLEM TO BE SOLVED: To provide a surface irregularities forming method for easily and inexpensively forming irregular shape on a resin surface without performing etching operation and optical film, and a transfer original mold, a transfer base film, a transfer film and a diffusing reflector using...

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Bibliographic Details
Main Authors TSURUOKA YASUO, IWAMURO MITSUNORI, KIZAWA KEIKO, TAI SEIJI
Format Patent
LanguageEnglish
Published 05.02.2004
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide a surface irregularities forming method for easily and inexpensively forming irregular shape on a resin surface without performing etching operation and optical film, and a transfer original mold, a transfer base film, a transfer film and a diffusing reflector using the method and manufacture methods for them. SOLUTION: The surface irregularities forming method is characterized by successively applying a stage for forming an energy sensitive negative type resin composition layer incorporating at least one or more kinds of monomers or oligomers which can be polymerized, a stage for radiating an active energy line at least once or more through a pattern-formed mask (active energy line radiation A), a stage for post-heating without performing the etching operation, and a stage for radiating the active energy line at least once or more (active energy line radiation B). COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020190514