SURFACE IRREGULARITIES FORMING METHOD, OPTICAL FILM OBTAINED THEREBY AND DIFFUSE REFLECTOR PLATE AND MANUFACTURE METHOD FOR DIFFUSE REFLECTOR PLATE

PROBLEM TO BE SOLVED: To provide a method for easily and inexpensively forming irregular shape on a resin surface, and a transfer original mold obtained by using the method, and a transfer original mold forming the transfer original mold, a transfer base film, a transfer film, a diffuse reflector pl...

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Bibliographic Details
Main Authors TSURUOKA YASUO, IWAMURO MITSUNORI, KIZAWA KEIKO, TAI SEIJI
Format Patent
LanguageEnglish
Published 05.02.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTROGRAPHY
FREQUENCY-CHANGING
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a method for easily and inexpensively forming irregular shape on a resin surface, and a transfer original mold obtained by using the method, and a transfer original mold forming the transfer original mold, a transfer base film, a transfer film, a diffuse reflector plate and an optical film. SOLUTION: The surface irregularities forming method includes a stage for forming an energy sensitive negative type resin composition layer including (a) at least one or more kinds of binder resin which can be polymerized, (b) at least one or more kinds of monomers or oligomers which can be polymerized and (c) a polymerization initiator generating a free radical by the radiation of an active energy line, wherein the compounding weight ratio of (a) the binder resin and (b) the monomers or the oligomers, (a):(b)=80:20 to 40:60, a stage for radiating the active energy line at least once or more through a pattern-formed mask, and a stage for post-heating without performing etching operation. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020190508