LARGE-AREA NEGATIVE ION SOURCE

PROBLEM TO BE SOLVED: To provide a large-area negative ion source capable of having a large area and high density and constantly generating negative ions. SOLUTION: This large-area negative ion source is provided with a vacuum vessel 1 extended in one direction and evacuated inside, a magnetic field...

Full description

Saved in:
Bibliographic Details
Main Authors MIENO SATORU, TSURUTA SHUICHI
Format Patent
LanguageEnglish
Published 29.01.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To provide a large-area negative ion source capable of having a large area and high density and constantly generating negative ions. SOLUTION: This large-area negative ion source is provided with a vacuum vessel 1 extended in one direction and evacuated inside, a magnetic field generating means 3 arranged in the outer circumference of the vacuum vessel 1 and forming a magnetic field along the longitudinal direction inside the vacuum vessel 1, a negative gas feeding means 5 feeding negative gas into the vacuum vessel 1, and a microwave emitting means 9 radiating microwaves to the inside of the vacuum vessel 1. A bored shield plate 11 having multiple punched holes 13 is arranged on the rear side inside the vacuum vessel 1. From the holes 3 in the bored shield plate 11 arranged on the rear side of the vacuum vessel 1, string plasma SP is emitted, and negative ions M are accumulated around the string plasm SP. In this way, the large-area negative ion is generated. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020181340