METHOD OF ANALYZING ERRORS OF EXPOSED POSITION, PATTERN FOR ANALYZING ERRORS OF EXPOSED POSITION, EXPOSURE MASK, AND EXPOSURE APPARATUS

• Main Author: NOUDO SHINICHIRO
• Format: Patent
• Language: English
• Published: 07.11.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a method of analyzing errors of exposed positions which separates and detects factors causing errors in accuracy of exposed positions in superimposed exposure. SOLUTION: A transfer pattern 7 is formed by performing a plurality of superimposed exposures in which one of three factors, an exposure optical system, a substrate W, and an exposure mask, which are used for superimposed exposure, is rotated by relatively 90 degrees each relative to the other two factors for superimposition to a ground pattern 5 on the substrate. The amount of misregistration in the transfer pattern 7 relative to the ground pattern 5 is measured for each rotation angle. Coordinate conversion is performed that returns the amount of misregistration measured for each rotation angle by the rotated angle. An average value of a plurality of amounts of misregistration acquired for each coordinate position that is coordinate-converted is acquired. The average value is assumed as an error in accuracy of exposed positions that may occur in each coordinate position caused by distortion in one factor that is rotated. COPYRIGHT: (C)2004,JPO