METHOD OF MANUFACTURING LIGHT SHIELDING LAYER PATTERN, AND LIGHT SHIELDING LAYER PATTERN PRODUCT

• Main Authors: KOBAYASHI HIRONORI, SONEHARA AKIO
• Format: Patent
• Language: English
• Published: 31.10.2003
• Edition: 7
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To provide a method of manufacturing a light shielding layer pattern by which a light shielding layer pattern with high sensitivity and high definition to be used for various kinds of color filters can be manufactured and the light-shielding pattern can be manufactured in a short period of time, and to provide a product having a light shielding layer pattern formed by the method. SOLUTION: After a photocatalyst-containing layer side substrate having a photocatalyst-containing layer and a substrate and a pattern forming substrate having a characteristics varying layer with variable surface characteristics by the effect of the photocatalyst in the photocatalyst-containing layer and a substrate are disposed in such a manner that the surface of the photocatalyst-containing layer is in contact with or at a distance from the characteristics variable layer, the substrates are irradiated with energy to change the characteristics of the exposed part by the effect of the photocatalyst in the photocatalyst-containing layer and to form a wettable pattern comprising a lyophilic region and a liquid repellent region in the characteristics varying layer. Then a composition for a light shielding layer is applied all over the surface of the pattern forming substrate where the wettable pattern is formed so as to deposit and fix the composition for the light shielding layer on the lyophilic region only to form the light shielding layer pattern. COPYRIGHT: (C)2004,JPO