METHOD OF TREATING SUBSTRATE

• Main Authors: NISHIJIMA KAZUHIRO, MIZUNO GOSHI
• Format: Patent
• Language: English
• Published: 27.06.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; NOZZLES; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To prevent change in quality and deterioration of the coating liquid in a nozzle by removing the coating liquid attaching to the nozzle. SOLUTION: After the delivery of the coating liquid, residual coating liquid inside the coating-liquid delivery nozzle 60 is sucked toward the supply-source side to retreat the top-end liquid level A of the coating liquid. At this moment, atmospheric gas H is flowed in the coating-liquid delivery nozzle 60. Then, the top-end 60a of the coating-liquid delivery nozzle 60 is immersed in a solvent S in a storage 80, and is cleaned. Under this condition, the coating liquid inside the coating-liquid delivery nozzle 60 is further sucked toward the supply-source side to introduce the solvent S within the top-end 60a, and the inside wall of the top-end 60a is cleaned by the solvent S. Besides, the opening of the coating- liquid delivery nozzle 60 is closed by the solvent S to separate the coating liquid within the coating-liquid delivery nozzle 60 from the atmosphere, preventing drying of the coating liquid. Furthermore, the coating liquid inside the coating-liquid delivery nozzle 60 is closed via the atmospheric gas H to prevent mixing of the solvent S with the coating liquid. COPYRIGHT: (C)2003,JPO