MEMBRANE STRUCTURE FOR MICRO-DEVICE, MICRO-DEVICE INCLUDING SAME, AND METHOD FOR MAKING THE SAME

PROBLEM TO BE SOLVED: To reduce deflection caused by etching. SOLUTION: Structure for a micro-device is fabricated by forming a first layer of sacrifical material, a layer of a structural material over the first sacrifical material layer, a second layer of sacrifical material over the structural mat...

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Bibliographic Details
Main Authors GULVIN PETER M, KUBBY JOEL A, EKLUND ELLIOTT A
Format Patent
LanguageEnglish
Published 24.06.2003
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To reduce deflection caused by etching. SOLUTION: Structure for a micro-device is fabricated by forming a first layer of sacrifical material, a layer of a structural material over the first sacrifical material layer, a second layer of sacrifical material over the structural material layer, and a protective layer over the second sacrifical material layer. A release etch is used to remove the first and second sacrifical material layers at substantially same rate. A structural feature is fabricated by forming a first layer of a first material, a layer of structural material over the first layer of the first material, at least one cut in the structural material layer, and a first layer of a sacrifical material different from the first material over the structural material layer such that an interface is created between the first layer of the sacrifical material and the first layer of the first material in at least one cut. COPYRIGHT: (C)2003,JPO
Bibliography:Application Number: JP20020317115