POSITIVE RESIST COMPOSITION
PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which has a specified structure and generates an acid...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
21.05.2003
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| Edition | 7 |
| Subjects | |
| Online Access | Get full text |
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| Abstract | PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which has a specified structure and generates an acid upon irradiation with an active ray or radiation and a polymer which is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of an acid. |
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| AbstractList | PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which has a specified structure and generates an acid upon irradiation with an active ray or radiation and a polymer which is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of an acid. |
| Author | TAKAHASHI AKIRA YASUNAMI SHOICHIRO |
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| Notes | Application Number: JP20010346121 |
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| RelatedCompanies | FUJI PHOTO FILM CO LTD |
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| Snippet | PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape... |
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| SubjectTerms | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| Title | POSITIVE RESIST COMPOSITION |
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