POSITIVE RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which has a specified structure and generates an acid...

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Bibliographic Details
Main Authors TAKAHASHI AKIRA, YASUNAMI SHOICHIRO
Format Patent
LanguageEnglish
Published 21.05.2003
Edition7
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a positive resist composition which is excellent in sensitivity and resolution and satisfies even a rectangular pattern shape and good edge roughness. SOLUTION: The positive resist composition comprises a compound which has a specified structure and generates an acid upon irradiation with an active ray or radiation and a polymer which is insoluble or slightly soluble in an aqueous alkali solution and is made soluble in the aqueous alkali solution by the action of an acid.
Bibliography:Application Number: JP20010346121