DECORATIVE MOLDING PROCESSING METHOD BY SMC MOLDING PRESS

PROBLEM TO BE SOLVED: To solve the problem that in conventional decorative molding processing, a nonwoven fabric or nonwoven paper 2 is stuck on an SMC plate material 1 to form an uneven pattern; however the depth the unevenness is restricted to about 1 mm, and when an uneven pattern, for example, 3...

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Bibliographic Details
Main Authors SATO TOSHIYUKI, MOTOMURA KAZUHIKO
Format Patent
LanguageEnglish
Published 20.05.2003
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To solve the problem that in conventional decorative molding processing, a nonwoven fabric or nonwoven paper 2 is stuck on an SMC plate material 1 to form an uneven pattern; however the depth the unevenness is restricted to about 1 mm, and when an uneven pattern, for example, 3 mm in depth is formed, the nonwoven fabric or the nonwoven paper 2 is broken and to create a decorative molding processing method which can form an uneven pattern, for example, 3 mm in depth having an effective visual effect while solving the above problem. SOLUTION: In the decorative molding processing method, the depth of the unevenness of the uneven pattern is 1-30 mm, the roundness of the uneven edge part of a mold is controlled to be 0.5-5 mm, and the SMC plate material 1 is subjected to integral decorative molding processing by using one plate to eliminate a clearance part in an SMC molding press.
Bibliography:Application Number: JP20010388491